Vacancy-type defects in bulk GaN grown by the Na-flux method probed using positron annihilation

被引:16
|
作者
Uedono, Akira [1 ]
Imanishi, Masayuki [2 ]
Imade, Mamoru [2 ]
Yoshimura, Masashi [2 ]
Ishibashi, Shoji [3 ]
Sumiya, Masatomo [4 ]
Mori, Yusuke [2 ]
机构
[1] Univ Tsukuba, Fac Pure & Appl Sci, Div Appl Phys, Tsukuba, Ibaraki 3058573, Japan
[2] Osaka Univ, Div Elect Elect & Informat Engn, 2-1 Yamadaoka, Suita, Osaka 5650871, Japan
[3] Natl Inst Adv Ind Sci & Technol, Res Ctr Computat Design Adv Funct Mat CD FMat, Tsukuba, Ibaraki 3058568, Japan
[4] Natl Inst Mat Sci, Wide Bandgap Mat Grp, Tsukuba, Ibaraki 3050044, Japan
基金
日本科学技术振兴机构;
关键词
Point defect; Single crystal growth; Nitrides; Semiconducting III-V materials; VAPOR-PHASE EPITAXY; POINT SEED CRYSTAL; AMMONOTHERMAL GAN; BEAM;
D O I
10.1016/j.jcrysgro.2017.06.027
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Defects in bulk GaN grown by the Na- flux method have been studied using a positron annihilation technique. Pyramidal bulk samples showed striation and inhomogeneous color distributions. Measurements of the Doppler broadening spectra of the annihilation radiation and lifetime spectra of positrons revealed that the concentration of vacancy-type defects increased with decreasing transparency of the samples. The major defect species was identified as a Ga vacancy coupled with nitrogen vacancies. A correlation between the oxygen incorporation and the introduction of such vacancies was observed. For c-plane GaN grown by a coalescence growth method, the concentration of vacancy-type defects was close to or under the detection limit of positron annihilation technique (<= 10(15) cm(-3)), suggesting that highquality bulk GaN can be fabricated using this method. (C) 2017 Elsevier B.V. All rights reserved.
引用
收藏
页码:261 / 265
页数:5
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