Effect of Negative Bias Temperature Instability on the Single Event Upset Response of 40 nm Flip-Flops

被引:15
|
作者
Kauppila, Amy V. [1 ]
Bhuva, Bharat L. [1 ,2 ]
Loveless, T. D. [1 ,2 ]
Jagannathan, S. [1 ]
Gaspard, N. J. [1 ]
Kauppila, J. S. [2 ]
Massengill, Lloyd W. [1 ,2 ]
Wen, S. J. [3 ]
Wong, R. [3 ]
Vaughn, G. L. [4 ]
Holman, W. Timothy [1 ,2 ]
机构
[1] Vanderbilt Univ, Dept Elect Engn & Comp Sci, Nashville, TN 37235 USA
[2] Vanderbilt Univ, Inst Space & Def Elect, Nashville, TN 37212 USA
[3] Cisco Syst Inc, San Jose, CA 95134 USA
[4] Univ Alabama Birmingham, Dept Elect & Comp Engn, Birmingham, AL 35294 USA
关键词
CMOS; negative bias temperature instability (NBTI); process variation; single event effects; single event upset; DESIGN;
D O I
10.1109/TNS.2012.2224136
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Negative bias temperature instability has been experimentally demonstrated to increase the cross-section of the single event response for 40 nm flip-flops. Analysis on the underlying mechanisms, including threshold voltage shift, is presented.
引用
收藏
页码:2651 / 2657
页数:7
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