共 148 条
- [1] Plasma atomic layer etching using conventional plasma equipment [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2009, 27 (01): : 37 - 50
- [4] [Anonymous], 1965, Electronics
- [5] Realization of atomic layer etching of silicon [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (06): : 3702 - 3705