GaNHFET digital circuit technology for harsh environments

被引:26
作者
Hussain, T [1 ]
Micovic, M [1 ]
Tsen, T [1 ]
Delaney, M [1 ]
Chow, D [1 ]
Schmitz, A [1 ]
Hashimoto, P [1 ]
Wong, D [1 ]
Moon, JS [1 ]
Hu, M [1 ]
Duvall, J [1 ]
McLaughlin, D [1 ]
机构
[1] HRL Labs LLC, Malibu, CA 90265 USA
关键词
D O I
10.1049/el:20031129
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The first demonstration of GaN digital circuits is reported. First-generation GaN digital technology has already shown high yields for circuits of considerable complexity. Specifically, a 31-stage ring oscillator was implemented using 217 transistors. Properties of the AlGaN/GaN material system that enable outstanding power handling capabilities of GaN heterejunction field effect transistors (HFETs), i.e. large bandgap, high breakdown field and high saturation velocity also make it attractive for digital applications in harsh environments. Because of these unique material characteristics GaN digital control circuits have the potential to operate in high radiation environments, at elevated temperature, and directly from high voltage rails. Successful operation of GaN 31-stage ring oscillators at the highest base-plate temperature attainable by test setup of 265degreesC, indicates these circuits can operate at significantly higher temperatures.
引用
收藏
页码:1708 / 1709
页数:2
相关论文
共 3 条
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[2]  
Micovic M., 2001, Device Research Conference. Conference Digest (Cat. No.01TH8561), P199, DOI 10.1109/DRC.2001.937930
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Wong, DWS ;
Moon, JS ;
McCray, L ;
Nguyen, C .
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