Enhanced device performances of WSe2-MoS2 van der Waals junction p-n diode by fluoropolymer encapsulation

被引:81
作者
Jeon, Pyo Jin [1 ]
Min, Sung-Wook [1 ]
Kim, Jin Sung [1 ]
Raza, Syed Raza Ali [1 ]
Choi, Kyunghee [1 ]
Lee, Hee Sung [1 ]
Lee, Young Tack [2 ]
Hwang, Do Kyung [2 ]
Choi, Hyoung Joon [1 ]
Im, Seongil [1 ]
机构
[1] Yonsei Univ, Inst Phys & Appl Phys, Seoul 120749, South Korea
[2] KIST, Interface Control Res Ctr, Future Convergence Res Technol Div, Seoul 136791, South Korea
基金
新加坡国家研究基金会;
关键词
BIAS LEAKAGE CURRENT; SURFACE-CHEMISTRY; LAYER MOS2; WSE2; GATE; TRANSISTORS; MONOLAYERS;
D O I
10.1039/c4tc02961e
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Two-dimensional heterojunction diodes with WSe2 and MoS2 nanoflakes respectively as p-and n-type semiconductors were fabricated on both glass and SiO2/p(+)-Si by direct imprinting. Superior electrostatic and dynamic performances were acquired from the diode on glass when an electric dipole-containing fluoropolymer was employed for encapsulation: forward and reverse current toward ideal behavior, enhanced aging/ambient stability, and improved dynamic rectification resulted.
引用
收藏
页码:2751 / 2758
页数:8
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