Surfactant Free, Non-aqueous Method, for the Deposition of ZnO Nanoparticle Thin Films on Si(100) Substrate with Tunable Ultraviolet (UV) Emission

被引：5
作者：
Brahma, Sanjaya [1 ,3 ]
Shivashankar, S. A. [1 ,2 ]
机构：
[1] Indian Inst Sci, Mat Res Ctr, Bangalore 560012, Karnataka, India
[2] Indian Inst Sci, Ctr Nano Sci & Engn, Bangalore 560012, Karnataka, India
[3] Natl Cheng Kung Univ, Ctr Micro Nano Sci & Technol, Tainan 701, Taiwan
来源：
CURRENT NANOSCIENCE | 2013年 / 9卷 / 03期
关键词：
Nanostructures; chemical synthesis; electron microscopy; optical properties; MICROWAVE-ASSISTED SYNTHESIS; OPTICAL-PROPERTIES; QUANTUM DOTS; PHOTOLUMINESCENCE; NANORODS; PLASMA; GROWTH; FABRICATION; IRRADIATION; NANOSTRUCTURES;
D O I：
10.2174/1573413711309030009
中图分类号：
Q81 [生物工程学（生物技术）]; Q93 [微生物学];
学科分类号：
071005 ; 0836 ; 090102 ; 100705 ;
摘要：
We report, strong ultraviolet (UV) emission from ZnO nanoparticle thin film obtained by a green synthesis, where the film is formed by the microwave irradiation of the alcohol solution of the precursor. The deposition is carried out in non-aqueous medium without the use of any surfactant, and the film formation is quick (5 min). The film is uniform comprising of mono-disperse nanoparticles having a narrow size distribution (15-22 nm), and that cover over an entire area (625 mm(2)) of the substrate. The growth rate is comparatively high (30-70 nm/min). It is possible to tune the morphology of the films and the UV emission by varying the process parameters. The growth mechanism is discussed precisely and schematic of the growth process is provided.
引用
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页码：346 / 350
页数：5
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