157nm optical lithography: The accomplishments and the challenges

被引：0

作者：

McClay, JA

McIntyre, ASL

机构：

[1] SVG Lithog Inc, Wilton, CT 06897 USA

[2] Intel Corp, Santa Clara, CA 95052 USA

来源：

SOLID STATE TECHNOLOGY | 1999年 / 42卷 / 06期

关键词：

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

In a relatively short period, 157nm lithography has gone from "not possible" to the forefront of optical lithography development efforts. While significant challenges remain, particularly for mask and pellicle technologies, recent but quiet development work on calcium fluoride, fluorine-laser sources, and alternative mask substrates has brought the industry back to a "can do" attitude.

引用

页码：57 / +

页数：7