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Electrical characterization of back-gated and top-gated germanium-core/silicon-shell nanowire field-effect transistors
被引:0
作者:
Simanullang, Marolop
[1
]
Wisna, Gde B. M.
[2
]
Cao, Wei
[3
]
Usami, Koichi
[1
]
Banerjee, Kaustav
[3
]
Oda, Shunri
[1
]
机构:
[1] Tokyo Inst Technol, Quantum Nanoelect Res Ctr, Tokyo, Japan
[2] Bandung Inst Technol, Dept Engn Phys, Bandung, Indonesia
[3] Univ Calif, Dept Elect & Comp Engn, Oakland, CA USA
来源:
2016 IEEE SILICON NANOELECTRONICS WORKSHOP (SNW)
|
2016年
关键词:
D O I:
暂无
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
Germanium-core/silicon-shell nanowires were grown by an ex-situ method where germanium nanowires were first grown using a vapour-liquid-solid growth mechanism, followed by catalyst removal in an etching solution and deposition of amorphous silicon on the nanowire sidewalls. Back-gated and top-gated field effect transistors based on germanium-core/silicon-shell nanowires exhibited p-type depletion mode characteristics. Field-effect hole mobilities up to 501 cm(2)/V.s were extracted from these nanowires.
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页码:116 / 117
页数:2
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