A SPDT RF Switch Small- and Large-signal Characteristics on TR-HR SOI Substrates

被引:0
|
作者
Esfeh, B. Kazemi [1 ]
Makovejev, S. [2 ]
Allibert, F. [3 ]
Raskin, J. -P. [1 ]
机构
[1] Catholic Univ Louvain, ICTEAM, B-1348 Louvain, Belgium
[2] Incize, Louvain, Belgium
[3] Soitec, Bernin, France
来源
2017 IEEE SOI-3D-SUBTHRESHOLD MICROELECTRONICS TECHNOLOGY UNIFIED CONFERENCE (S3S) | 2017年
关键词
RF switch; SOI; trap-rich (TR); RFeSI; SPDT; harmonic distortion; insertion loss; isolation;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper evaluates the small- and large-signal characteristics of a single pole double thru (SPDT) RF antenna switch including its insertion loss, isolation and non-linear behavior. It is fabricated on two different types of high resistivity (HR) Silicon-on-Insulator (SOI) substrates: one standard (HR-SOI) and one trap-rich (RFeSI80). Using a special test structure, the contribution of substrate and active devices is separated for both in small- and large-signal. It is shown that by using trap-rich substrate technology, a reduction of more than 17 dB of 2nd harmonic is achieved compared with HR SOI substrate.
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页数:3
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