TiAlN film preparation by Y-shape filtered-arc-deposition system

被引：19

作者：

Mashiki, Takayuki ^{[1
]}

Hikosaka, Hiroki ^{[1
]}

Tanoue, Hideto ^{[1
]}

Takikawa, Hirofumi ^{[1
]}

Hasegawa, Yushi ^{[2
]}

Taki, Makoto ^{[2
]}

Kumagai, Masao ^{[3
]}

Kamiya, Masao ^{[1
,4
]}

机构：

[1] Toyohashi Univ Technol, Dept Elect & Elect Engn, Aichi 4418580, Japan

[2] Onward Ceram Coating Co Ltd, Off Res & Dev, Nomi, Ishikawa 9290111, Japan

[3] Kanagawa Ind Technol Res Ctr, Mat Technol Div, Ebina, Kanagawa 2430435, Japan

[4] Itoh Opt Ind Co Ltd, Dev Technol Dept, Aichi 4430041, Japan

来源：

THIN SOLID FILMS | 2008年 / 516卷 / 19期

基金：

日本学术振兴会; 日本科学技术振兴机构;

关键词：

Y-FAD; TiAlN; composition distribution; film properties;

D O I：

10.1016/j.tsf.2007.11.097

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A Y-shape filtered-arc-deposition system, which has two arc sources and a common plasma-transport-duct, was operated under nitrogen gas, and a titanium aluminum nitride (TiAlN) thin film was prepared with Ti and Al cathodes. Two filtered-arc plasma beams were not completely combined into one beam even at the exit of the common duct. Thus, TiAlN film with composition-uniform distribution was not obtained at the fixed substrate position. However, different composition films were easily obtained at one time. Then various-composition films of TiAlN with different arc currents were prepared and film properties were measured. The surface roughness in arithmetical mean roughness was less than 3 run on a 1.5-nm roughness substrate. The density of TiAlN increased with the Ti-content ratio, and its hardness tended to weakly increase with Al-content ratio. The maximum hardness was 36 GPa. Ti-rich film has internal compression stress and Al-rich film has internal tensile stress. (C) 2007 Elsevier B.V. All rights reserved.

引用

页码：6650 / 6654

页数：5

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