Growth and Properties of ZnO Films Grown by the Ultrasonic Spray-Assisted CVD

ZnO films were successfully grown on the glass substrates employing an ultrasonic spray-assisted CVD method at 573-673 K. The optical properties, electrical characteristics and crystalline structures of the films were characterized. Effects of the growth temperatures on the film properties were studied. The film growth mode, morphology, transmittance, conductivity and emission properties are very sensitive to the growth temperatures. Growing at lower temperatures would improve both the preferential growth along c-axis and smoothness of the films. The conductivity and transmittance of the films grown at 573 K are also superior to that grown at higher temperatures. All films exhibit strong emission in the visible region and weak emission in UV region. However, the relative intensity of the UV emission to visible emission of the film grown at 573 K is obviously stronger than that grown at higher temperatures.