Electrical transport in boron-doped polycrystalline zinc oxide thin films

被引:34
作者
Steinhauser, J. [1 ]
Fay, S. [1 ]
Oliveira, N. [1 ]
Vallat-Sauvain, E. [1 ]
Zimin, D. [2 ]
Kroll, U. [3 ]
Ballif, C. [1 ]
机构
[1] Univ Neuchatel, Inst Microtechnol, CH-2000 Neuchatel, Switzerland
[2] OC Oerlikon Balzers AG, Balzers, Liechtenstein
[3] Oerlikon Solar Lab SA, CH-2000 Neuchatel, Switzerland
来源
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE | 2008年 / 205卷 / 08期
关键词
D O I
10.1002/pssa.200778878
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Boron doped Zinc oxide (ZnO: B) thin films are commonly used a stransparent conductive oxide (TCO) in thin film silicon solar cells TCO films with a high electrical conductivity combined with high transparency are required for this application. In this paper the electronic transport properties in polycrystalline ZnO: B grown by low pressure chemical vapor deposition (LPCVD) were investigated using Hall effect measurements and optical spectroscopy techniques. The systematic comparison between the optical mobility values deduced from the reflectance spectra using the Drude model, and the Hall mobility values, allowed us to clearly separate the respective influences on the electrical transport of potential barrier at grain boundaries and intragrain scattering. By analyzing the results for samples with large variation of grain size and doping boundary scattering to intragrain scattering. Finally, the stability of LPGVD ZnO: B in a humid environment was also investigated. The degradation of the electrical film properties due to damp heat treatment is analyzed and discussed. (c) 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
引用
收藏
页码:1983 / 1987
页数:5
相关论文
共 22 条
[1]   Efforts to improve carrier mobility in radio frequency sputtered aluminum doped zinc oxide films [J].
Agashe, C ;
Kluth, O ;
Hüpkes, J ;
Zastrow, U ;
Rech, B ;
Wuttig, M .
JOURNAL OF APPLIED PHYSICS, 2004, 95 (04) :1911-1917
[2]   Influence of thermal annealing on optical and electrical properties of ZnO films prepared by electron beam evaporation [J].
Aghamalyan, NR ;
Gambaryan, IA ;
Goulanian, EK ;
Hovsepyan, RK ;
Kostanyan, RB ;
Petrosyan, SI ;
Vardanyan, ES ;
Zerrouk, AF .
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2003, 18 (06) :525-529
[3]   CORRELATION BETWEEN STRUCTURAL AND ELECTRICAL-PROPERTIES OF SPRAYED TIN OXIDE-FILMS WITH AND WITHOUT FLUORINE DOPING [J].
BRUNEAUX, J ;
CACHET, H ;
FROMENT, M ;
MESSAD, A .
THIN SOLID FILMS, 1991, 197 (1-2) :129-142
[4]   Resistivity of polycrystalline zinc oxide films: current status and physical limit [J].
Ellmer, K .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2001, 34 (21) :3097-3108
[5]   Rough ZnO layers by LP-CVD process and their effect in improving performances of amorphous and microcrystalline silicon solar cells [J].
Fay, S. ;
Feitknecht, L. ;
Schluchter, R. ;
Kroll, U. ;
Vallat-Sauvain, E. ;
Shah, A. .
SOLAR ENERGY MATERIALS AND SOLAR CELLS, 2006, 90 (18-19) :2960-2967
[6]   Sol-gel deposited Sb-doped tin oxide films [J].
Guglielmi, M ;
Menegazzo, E ;
Paolizzi, M ;
Gasparro, G ;
Ganz, D ;
Pütz, J ;
Aegerter, MA ;
Hubert-Pfalzgraf, L ;
Pascual, C ;
Durán, A ;
Willems, HX ;
Van Bommel, M ;
Büttgenbach, L ;
Costa, L .
JOURNAL OF SOL-GEL SCIENCE AND TECHNOLOGY, 1998, 13 (1-3) :679-683
[7]   EVAPORATED SN-DOPED IN2O3 FILMS - BASIC OPTICAL-PROPERTIES AND APPLICATIONS TO ENERGY-EFFICIENT WINDOWS [J].
HAMBERG, I ;
GRANQVIST, CG .
JOURNAL OF APPLIED PHYSICS, 1986, 60 (11) :R123-R159
[8]   OPTICAL-PROPERTIES OF SPUTTER-DEPOSITED ZNO-AL THIN-FILMS [J].
JIN, ZC ;
HAMBERG, I ;
GRANQVIST, CG .
JOURNAL OF APPLIED PHYSICS, 1988, 64 (10) :5117-5131
[9]  
Kroll U., 2006, P 21 EU PVSEC DRESD, P1551
[10]   Scattering mechanisms and electronic behavior in transparent conducting ZnxIn2Ox+3 indium-zinc oxide thin films [J].
Marcel, C ;
Naghavi, N ;
Couturier, G ;
Salardenne, J ;
Tarascon, JM .
JOURNAL OF APPLIED PHYSICS, 2002, 91 (07) :4291-4297