Monolithic 3D Integrated Circuits: Recent Trends and Future Prospects

被引:30
作者
Dhananjay, Krithika [1 ]
Shukla, Prachi [2 ]
Pavlidis, Vasilis F. [3 ]
Coskun, Ayse [2 ]
Salman, Emre [1 ]
机构
[1] SUNY Stony Brook, Dept Elect & Comp Engn, Stony Brook, NY 11794 USA
[2] Boston Univ, Dept Elect & Comp Engn, Boston, MA 02215 USA
[3] Univ Manchester, Dept Comp Sci, Manchester M13 9PL, Lancs, England
基金
美国国家科学基金会;
关键词
Three-dimensional displays; Two dimensional displays; Transistors; Tools; Integrated circuits; Fabrication; Through-silicon vias; Three-dimensional integrated circuits; monolithic integrated circuits; through-silicon vias; fabrication; physical design; thermal management; testing; neural networks; security; computer applications; OPTIMIZATION; PERFORMANCE; METHODOLOGY; CHALLENGES; DESIGN;
D O I
10.1109/TCSII.2021.3051250
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Monolithic 3D integration technology has emerged as an alternative candidate to conventional transistor scaling. Unlike conventional processes where multiple metal layers are fabricated above a single transistor layer, monolithic 3D technology enables multiple transistor layers above a single substrate. By providing vertical interconnects with physical dimensions similar to conventional metal vias, monolithic 3D technology enables unprecedented integration density and high bandwidth communication, which plays a critical role for various data-centric applications. Despite growing number of research efforts on various aspects of monolithic 3D integration, commercial monolithic 3D ICs do not yet exist. This tutorial brief provides a concise overview of monolithic 3D technology, highlighting important results and future prospects. Several applications that can potentially benefit from this technology are also discussed.
引用
收藏
页码:837 / 843
页数:7
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