MASS PRODUCTION AND FILM THICKNESS CONTROL OF MESO POROUS SILICA THIN FILMS

被引:0
作者
Tamada, Makio [1 ]
Sunami, Yuta [1 ]
机构
[1] Tokai Univ, Hiratsuka, Kanagawa, Japan
来源
PROCEEDINGS OF THE ASME 2020 29TH CONFERENCE ON INFORMATION STORAGE AND PROCESSING SYSTEMS (ISPS2020) | 2020年
关键词
Mass production; Mesoporous silica; Micro; Nano; Thickness control; coating;
D O I
暂无
中图分类号
TP3 [计算技术、计算机技术];
学科分类号
0812 ;
摘要
Mesoporous silica (referred to as MPS), which has pores of hexagonal or cubic structure of several nm to several tens of nm on the surface, is attracting attention as a new material. MPS has a very large specific surface area, so it is used as an adsorbent for gas and water vapor, as a moisture absorbent, and as a separating material. Transparent MPS is also expected to be an optical functional material. MPS thin film is expected to be used as a thin film as an application example. Since MPS thin film can be used in various applications, it will be further developed by mass production. Leads to Therefore, in this study, mass production of MPS thin films and controlled the film thickness was studied. Roll-to-roll (referred to as R2R) production method and a micro gravure printing method was adopted as a method of mass production: transporting polypropylene film and coating on it. As a result, the MPS thin film prepared in this study had a pore structure. it was confirmed that the film thickness could be controlled by changing the peripheral speed ratio. It is considered that the size of the liquid pool between the coating rolls changed. The size and arrangement of the pores could be confirmed by FE-SEM observation.
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页数:3
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