Compact model (CM);
current collapse (CC);
drain lag;
gate lag;
high electron-mobility transistors (HEMTs);
interface traps;
pulsed I-V;
FIELD-EFFECT TRANSISTORS;
ELECTRON-MOBILITY TRANSISTORS;
CURRENT COLLAPSE;
FREQUENCY-DEPENDENCE;
ALGAN/GAN HEMTS;
GAAS-MESFETS;
DENSITY;
SEMICONDUCTOR;
GENERATION;
DISPERSION;
D O I:
10.1109/TED.2016.2533165
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
A comprehensive scalable trap-charge model for the dc and pulsed I-V modeling of GaN high electron-mobility transistor is presented. While interface traps are considered for dc I-V modeling, surface states and traps in the AlGaN barrier and GaN buffer are considered for the pulsed I-V model. A surface-potential-based model is presented for interface traps, which is then adapted to the current model for the dc modeling. For the pulsed I-V modeling, a semiempirical approach is proposed for gate lag as well as both gate-lag and drain-lag conditions. The model is able to capture the effects of gate (V-gq) and drain (V-dq) quiescent biases as well as the stress time (T-OFF), and is validated with both numerical simulation and measurement data. Finally, for the accurate transient simulations in switching applications, the emission of electrons is also modeled in Verilog-A using an asymptotic solution of a differential equation, which can be a better alternative to that of the RC subcircuit approach.