A Comprehensive Compact Model for GaN HEMTs, Including Quasi-Steady-State and Transient Trap-Charge Effects

被引:26
作者
Syamal, Binit [1 ,2 ]
Zhou, Xing [1 ]
Ben Chiah, Siau [1 ]
Jesudas, Anand M. [1 ]
Arulkumaran, Subramaniam [3 ]
Ng, Geok Ing [1 ,3 ]
机构
[1] Nanyang Technol Univ, NOVITAS, Nanoelect Ctr Excellence, Sch Elect & Elect Engn, Singapore 639798, Singapore
[2] GLOBALFOUNDRIES, Singapore 738406, Singapore
[3] Nanyang Technol Univ, Temasek Labs, Singapore 637553, Singapore
基金
新加坡国家研究基金会;
关键词
Compact model (CM); current collapse (CC); drain lag; gate lag; high electron-mobility transistors (HEMTs); interface traps; pulsed I-V; FIELD-EFFECT TRANSISTORS; ELECTRON-MOBILITY TRANSISTORS; CURRENT COLLAPSE; FREQUENCY-DEPENDENCE; ALGAN/GAN HEMTS; GAAS-MESFETS; DENSITY; SEMICONDUCTOR; GENERATION; DISPERSION;
D O I
10.1109/TED.2016.2533165
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A comprehensive scalable trap-charge model for the dc and pulsed I-V modeling of GaN high electron-mobility transistor is presented. While interface traps are considered for dc I-V modeling, surface states and traps in the AlGaN barrier and GaN buffer are considered for the pulsed I-V model. A surface-potential-based model is presented for interface traps, which is then adapted to the current model for the dc modeling. For the pulsed I-V modeling, a semiempirical approach is proposed for gate lag as well as both gate-lag and drain-lag conditions. The model is able to capture the effects of gate (V-gq) and drain (V-dq) quiescent biases as well as the stress time (T-OFF), and is validated with both numerical simulation and measurement data. Finally, for the accurate transient simulations in switching applications, the emission of electrons is also modeled in Verilog-A using an asymptotic solution of a differential equation, which can be a better alternative to that of the RC subcircuit approach.
引用
收藏
页码:1478 / 1485
页数:8
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