Electrically conducting, ultra-sharp, high aspect-ratio probes for AFM fabricated by electron-beam-induced deposition of platinum

被引：23

作者：

Brown, Jason ^{[1
]}

Kocher, Paul ^{[1
]}

Ramanujan, Chandra S. ^{[1
]}

Sharp, David N. ^{[1
]}

Torimitsu, Keiichi ^{[2
]}

Ryan, John F. ^{[1
]}

机构：

[1] Univ Oxford, Dept Phys, Clarendon Lab, Oxford OX1 3PU, England

[2] NTT Corp, NTT Basic Res Labs, Atsugi, Kanagawa 2430198, Japan

来源：

ULTRAMICROSCOPY | 2013年 / 133卷

关键词：

AFM probes; Conducting AFM; Electron-beam-induced deposition; CARBON NANOTUBES; FORCE MICROSCOPY; TIPS;

D O I：

10.1016/j.ultramic.2013.05.005

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

We report on the fabrication of electrically conducting, ultra-sharp, high-aspect ratio probes for atomic force microscopy by electron-beam-induced deposition of platinum. Probes of 4.0 perpendicular to 1.0 nm radius-of-curvature are routinely produced with high repeatability and near-100% yield. Contact-mode topographical imaging of the granular nature of a sputtered gold surface is used to assess the imaging performance of the probes, and the derived power spectral density plots are used to quantify the enhanced sensitivity as a function of spatial frequency. The ability of the probes to reproduce high aspect-ratio features is illustrated by imaging a close-packed array of nanospheres. The electrical resistance of the probes is measured to be of order 100 k Omega. 2013 Elsevier B.V. All rights reserved,

引用

页码：62 / 66

页数：5

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