Post-annealing effect upon optical properties of electron beam evaporated molybdenum oxide thin films

被引：75

作者：

Lin, Shih-Yuan ^{[2
]}

Chen, Ying-Chung ^{[2
]}

Wang, Chih-Ming ^{[1
]}

Hsieh, Po-Tsung ^{[3
]}

Shih, Shun-Chou ^{[1
]}

机构：

[1] Cheng Shiu Univ, Dept Elect Engn, Kaohsiung 833, Taiwan

[2] Natl Sun Yat Sen Univ, Dept Elect Engn, Kaohsiung, Taiwan

[3] Natl Cheng Kung Univ, Ctr Micro Nano Sci & Technol, Tainan 70101, Taiwan

来源：

APPLIED SURFACE SCIENCE | 2009年 / 255卷 / 06期

关键词：

MoO3 thin films; Electron beam evaporation; Post-annealing; Optical properties; Oxygen vacancies; MOO3; FILMS; TEMPERATURE; DEVICES;

D O I：

10.1016/j.apsusc.2008.10.069

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Molybdenum oxide (MoO3) thin films were deposited by electron beam evaporation. The chemical composition, microstructure, optical and electrical properties of MoO3 thin films depend on the annealing temperature and ambient atmosphere. X-ray diffraction (XRD) shows that crystalline MoO3 films can be obtained at various post-annealing temperatures from 200 to 500 degrees C in N-2 and O-2. X-ray photoelectron spectroscopy (XPS) results reveal that the O-1s emission peak was shifted slightly toward lower binding energies as the annealing temperature in N-2 was increased. The oxygen vacancies and conductivity of MoO3 film increased with the annealing temperature. However, when the MoO3 films were annealed in an atmosphere of O-2, the optical transmission, the O/Mo ratio and the photon energy increased with the annealing temperature. The results differ from those for films annealed in a N-2 atmosphere. (c) 2008 Elsevier B.V. All rights reserved.

引用

页码：3868 / 3874

页数：7

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