Recent advances and comprehensive insights on nickel oxide in emerging optoelectronic devices

被引:51
作者
Gong, Yongshuai [1 ]
Zhang, Shuai [1 ]
Gao, Huaizhi [1 ]
Ma, Zongwen [1 ]
Hu, Siqian [2 ]
Tan, Zhan'an [1 ]
机构
[1] Beijing Univ Chem Technol, Beijing Adv Innovat Ctr Soft Matter Sci & Engn, State Key Lab Organ Inorgan Composites, Beijing 100029, Peoples R China
[2] Jianghan Univ, Key Lab Optoelect Chem Mat & Devices, Minist Educ, Wuhan 430056, Peoples R China
基金
中国国家自然科学基金;
关键词
PEROVSKITE SOLAR-CELLS; LIGHT-EMITTING-DIODES; HOLE TRANSPORT LAYER; ANODE BUFFER LAYER; NIO THIN-FILMS; PROCESSED TITANIUM CHELATE; ASSISTED SOLUTION PROCESS; CORE-SHELL NANOPARTICLES; TRANSITION-METAL OXIDES; ELECTRON BLOCKING LAYER;
D O I
10.1039/d0se00621a
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Metal oxide semiconductors, exhibiting excellent optical transparency, high carrier mobilities, good mechanical stress tolerance and environmental stability, have been widely used in emerging optoelectronic devices (OEDs), such as dye-sensitized solar cells (DSSCs), perovskite solar cells (PerSCs), organic solar cells (OSCs) and various light-emitting diodes (LEDs). Among them, nickel oxide (NiO) is a typical p-type metal oxide and plays important roles in these emerging OEDs, such as photocathodes in p-type DSSCs, and hole transport layers (HTL) or hole injection layers (HIL) or electron blocking layers (EBL) in PerSCs, OSCs and LEDs. This comprehensive review delivers a summary of recent progress in emerging OEDs with NiO, explains how NiO works in different devices, demonstrates the influence of the electronic structure and surface chemistry of NiO on the device performance, and emphasizes the effects of morphology, components and post-treatment on the optoelectronic properties of NiO. The extant problems and future directions for further development of NiO in OEDs are discussed in the end.
引用
收藏
页码:4415 / 4458
页数:44
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