Deposition of tungsten oxide films by reactive magnetron sputtering on different substrates

被引：7

作者：

Hrubantova, A. ^{[1
,2
]}

Hippler, R. ^{[1
,3
]}

Wulff, H. ^{[3
]}

Cada, M. ^{[1
]}

Olejnicek, J. ^{[1
]}

Nepomniashchaia, N. ^{[1
,4
]}

Helm, C. A. ^{[3
]}

Hubicka, Z. ^{[1
]}

机构：

[1] Czech Acad Sci, Inst Phys, Na Slovance 2, Prague 18221 8, Czech Republic

[2] Palacky Univ Olomouc, Joint Lab Opt, Av 17 Listopadu 50A, Olomouc 77207, Czech Republic

[3] Univ Greifswald, Inst Phys, Felix Hausdorff Str 6, D-17489 Greifswald, Germany

[4] Czech Tech Univ, Fac Nucl Sci & Phys Engn, Brehova 7, Prague 11519 1, Czech Republic

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2022年 / 40卷 / 06期

关键词：

OPTICAL-PROPERTIES;

D O I：

10.1116/6.0002012

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Tungsten oxide films are deposited with the help of reactive magnetron sputtering in an argon/oxygen gas mixture. Films are deposited on different substrates, in particular, on soda lime glass, fluorine-doped tin oxide coated glass, silicon (Si), and quartz ( SiO2). Thin films from three different discharge modes, in particular, high power impulse magnetron sputtering, midfrequency magnetron sputtering, and radiofrequency magnetron sputtering, are compared. Deposited films are characterized by x-ray diffraction, Raman spectroscopy, and spectroscopic ellipsometry. Composition, crystal structure, and optical properties of as-deposited and annealed films are found to depend on the deposition mode and on the substrate.

引用

页数：7

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