The role of chelating agents on the corrosion mechanisms of aluminium in alkaline aqueous solutions

被引:66
作者
Mercier, D. [1 ]
Barthes-Labrousse, M. -G. [1 ]
机构
[1] CNRS, Ctr Etud Chim Met, F-94407 Vitry Sur Seine, France
关键词
Aluminium; Alkaline corrosion; Chelating agents; Corrosion accelerator; Synergistic effects; PALLADIUM(II) BISETHYLENEDIAMINE COMPLEXES; EPOXY-AMINE/METAL INTERPHASES; DROPPING-MERCURY-ELECTRODE; ZNO THIN-FILMS; HYDROXYETHYLENEDIAMINE COMPLEXES; ELECTROCHEMICAL-BEHAVIOR; PRACTICAL ADHESION; ANODIC-DISSOLUTION; METAL-SURFACES; PURE ALUMINUM;
D O I
10.1016/j.corsci.2008.10.035
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The influence of 1,2-diaminoethane (DAE) on the mechanism of aluminium corrosion in KOH solutions at pH 13 was investigated by combining time-resolved inductively coupled plasma optical emission spectrocopy, open-circuit potential measurements and X-ray photoelectron spectroscopy. In pure KOH solutions, a very slow corrosion rate is initially observed, corresponding to the dissolution or the native oxide layer. Following this incubation stage, the corrosion rate is increasing due to the formation and oxidation of Al hydride, until a steady state is reached. DAE behaves as a strong initial corrosion accelerator, due to synergistic effects with hydroxyl ions and a dissolution mechanism in three successive steps has been proposed: (i) a rapid initial dissolution induced by the formation and detachment from the surface of bidentate (chelate) Al-DAE metal bound surface complexes; (ii) a slower step ascribed to the formation and release of monodentate Al-DAE metal bound surface complexes and (iii) a final step dominated by direct oxidation of surface aluminium hydride by hydroxyl species as in pure KOH. (C) 2008 Elsevier Ltd. All rights reserved.
引用
收藏
页码:339 / 348
页数:10
相关论文
共 57 条
[1]   Factors controlling the time evolution of the corrosion potential of aluminum in alkaline solutions [J].
Adhikari, Saikat ;
Hebert, Kurt R. .
CORROSION SCIENCE, 2008, 50 (05) :1414-1421
[2]   Participation of aluminum hydride in the anodic dissolution of aluminum in alkaline solutions [J].
Adhikari, Saikat ;
Hebert, Kurt R. .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2008, 155 (05) :C189-C195
[3]   Formation of aluminum hydride during alkaline dissolution of aluminum [J].
Adhikari, Saikat ;
Lee, Jinju ;
Hebert, Kurt R. .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2008, 155 (01) :C16-C21
[4]   Electrochemistry of copper in aqueous ethylenediamine solutions [J].
Aksu, S ;
Doyle, FM .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2002, 149 (07) :B340-B347
[5]   Compositional variation within the epoxy/adherend interphase [J].
Arayasantiparb, D ;
McKnight, S ;
Libera, M .
JOURNAL OF ADHESION SCIENCE AND TECHNOLOGY, 2001, 15 (12) :1463-1484
[6]   Epoxy-amine/metal interphases: Influences from sharp needle-like crystal formation [J].
Aufray, Maelenn ;
Roche, Alain Andre .
INTERNATIONAL JOURNAL OF ADHESION AND ADHESIVES, 2007, 27 (05) :387-393
[7]   Residual stresses and practical adhesion: effect of organo-metallic complex formation and crystallization [J].
Aufray, Maelenn ;
Roche, Alain Andre .
JOURNAL OF ADHESION SCIENCE AND TECHNOLOGY, 2006, 20 (16) :1889-1903
[8]   The acid-base properties of the surface of native zinc oxide layers:: An XPS study of adsorption of 1,2-diaminoethane [J].
Ballerini, G. ;
Ogle, K. ;
Barthes-Labrousse, M-G. .
APPLIED SURFACE SCIENCE, 2007, 253 (16) :6860-6867
[9]   Adhesion mechanisms at amine-cured epoxy/aluminium interfaces [J].
Barthés-Labrousse, MG .
JOURNAL OF ADHESION, 1996, 57 (1-4) :65-75
[10]   Acid-base characterisation of flat oxide-covered metal surfaces [J].
Barthés-Labrousse, MG .
VACUUM, 2002, 67 (3-4) :385-392