Time-resolved temperature measurement and numerical simulation of millisecond laser irradiated silicon

被引:43
作者
Li, Zewen [1 ]
Zhang, Hongchao [1 ]
Shen, Zhonghua [1 ]
Ni, Xiaowu [1 ]
机构
[1] Nanjing Univ Sci & Technol, Sch Sci, Nanjing 210094, Jiangsu, Peoples R China
关键词
INDUCED DAMAGE; THIN-FILMS; SOLIDIFICATION; EMISSIVITY;
D O I
10.1063/1.4815872
中图分类号
O59 [应用物理学];
学科分类号
摘要
Thermal process of 1064 nm millisecond pulsed Nd:YAG laser irradiated silicon was time-resolved temperature measured by an infrared radiation pyrometer, temperature evolutions of the spot center for wide range of laser energy densities were presented. The waveforms of temperature evolution curves contained much information about phase change, melting, solidification and vaporization. An axisymmetric numerical model was established for millisecond laser heating silicon. The transient temperature fields were obtained by using the finite element method. The numerical results of temperature evolutions of the spot center are in good agreement with the experimental results. Furthermore, the axial temperature distributions of the numerical results give a better understanding of the waveforms in the experimental results. The melting threshold, vaporizing threshold, melting duration, and melting depth were better identified by analyzing two kinds of results. (C) 2013 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution 3.0 Unported License.
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页数:8
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共 27 条
[1]   Fabrication and application of micro thin film thermocouples for transient temperature measurement in nanosecond pulsed laser micromachining of nickel [J].
Choi, Hongseok ;
Li, Xiaochun .
SENSORS AND ACTUATORS A-PHYSICAL, 2007, 136 (01) :118-124
[2]   Surface temperature evolution in pulsed laser action of millisecond range [J].
Doubenskaia, M. ;
Smurov, I. .
APPLIED SURFACE SCIENCE, 2006, 252 (13) :4472-4476
[3]   Calculation of the density and heat capacity of silicon by molecular dynamics simulation [J].
Endo, Rie Kojima ;
Fujihara, Yusuke ;
Susa, Masahiro .
High Temperatures - High Pressures, 2003, 35-36 (05) :505-511
[4]   THERMAL CONDUCTIVITY OF SILICON + GERMANIUM FROM 3 DEGREES K TO MELTING POINT [J].
GLASSBRENNER, CJ ;
SLACK, GA .
PHYSICAL REVIEW, 1964, 134 (4A) :1058-+
[5]   Excimer laser-induced temperature field in melting and resolidification of silicon thin films [J].
Hatano, M ;
Moon, S ;
Lee, M ;
Suzuki, K ;
Grigoropoulos, CP .
JOURNAL OF APPLIED PHYSICS, 2000, 87 (01) :36-43
[6]   Ultra Shallow Arsenic Junctions in Germanium Formed by Millisecond Laser Annealing [J].
Hellings, Geert ;
Rosseel, Erik ;
Simoen, Eddy ;
Radisic, Dunja ;
Petersen, Dirch Hjorth ;
Hansen, Ole ;
Nielsen, Peter Folmer ;
Zschatzsch, Gerd ;
Nazir, Aftab ;
Clarysse, Trudo ;
Vandervorst, Wilfried ;
Hoffmann, Thomas Y. ;
De Meyer, Kristin .
ELECTROCHEMICAL AND SOLID STATE LETTERS, 2011, 14 (01) :II39-II41
[7]   Solidification temperature of silicon surface layer melted by pulsed laser irradiation [J].
Ivlev, GD ;
Gatskevich, EI .
APPLIED SURFACE SCIENCE, 1999, 143 (1-4) :265-271
[8]   Time-resolved, local temperature measurements during pulsed laser heating [J].
Kappes, Ralf S. ;
Li, Chen ;
Butt, Hans-Juergen ;
Gutmann, Jochen S. .
NEW JOURNAL OF PHYSICS, 2010, 12
[9]   Complete experimental test of kinetic models for rapid alloy solidification [J].
Kittl, JA ;
Sanders, PG ;
Aziz, MJ ;
Brunco, DP ;
Thompson, MO .
ACTA MATERIALIA, 2000, 48 (20) :4797-4811
[10]   Mechanistic benefits of millisecond annealing for diffusion and activation of boron in silicon [J].
Kwok, Charlotte T. M. ;
Braatz, Richard D. ;
Paul, Silke ;
Lerch, Wilfried ;
Seebauer, Edmund G. .
JOURNAL OF APPLIED PHYSICS, 2009, 105 (06)