Recent development of photosensitive polybenzoxazoles

Photosensitive polybenzoxazoles (PSPBOs) have been attracting great attention as insulating materials in microelectronic industry, and can be directly patterned to simplify processing steps. This article reviews recent works on development of PSPBOs. After brief introduction, a typical formulation method of PSPBOs was described, followed by a facile synthetic method of a precursor of PBOs, highly sensitive PSPBOs, highly transparent poly(o-hydroxy amide)s (PHAs), an efficient catalyst for low-temperature cyclization of PHA, and finally other applications of PSPBOs.