Investigation of the maskless lithography technique for the rapid and cost-effective prototyping of microfluidic devices in laboratories

被引：31
作者：
Xiang, Nan [1 ,2 ]
Yi, Hong [1 ,2 ]
Chen, Ke [1 ,2 ]
Wang, Shanfang [1 ,2 ]
Ni, Zhonghua [1 ,2 ]
机构：
[1] Southeast Univ, Sch Mech Engn, Nanjing 211189, Jiangsu, Peoples R China
[2] Jiangsu Key Lab Design & Mfg Micronano Biomed Ins, Nanjing 211189, Jiangsu, Peoples R China
来源：
JOURNAL OF MICROMECHANICS AND MICROENGINEERING | 2013年 / 23卷 / 02期
基金：
中国国家自然科学基金;
关键词：
MICROSCOPE PROJECTION PHOTOLITHOGRAPHY; SOFT-LITHOGRAPHY; FABRICATION; SYSTEMS; POLY(DIMETHYLSILOXANE); MICROFABRICATION; MICROCHANNELS; TECHNOLOGIES; PHOTORESIST; MICROARRAYS;
D O I：
10.1088/0960-1317/23/2/025016
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
This paper describes maskless lithography as a rapid and cost-effective technique for fabricating high-quality microfluidic devices in laboratories. The detailed effects of exposure parameters on microstructure features are explored. A quantitative analysis of these effects provides insights into the device design and the selection of optimum processing parameters. To overcome the limitation of small exposure area, subregion stitching and sequential exposure are adopted for fabricating larger patterns. Seamless stitching between adjacent exposure subregions is achieved by optimizing the grayscale values of the stitching side/corner. These data are also valuable for exploring grayscale and multi-step lithography. Various hydrodynamic microdevices are then fabricated and characterized to validate the optimized parameters.
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页数：11
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