An improved heterojunction-emitter bipolar transistor using δ-doped and spacer layers

被引:6
作者
Lin, YS
Hsu, WC
Lu, SY
Su, JS
Lin, W
机构
[1] Natl Cheng Kung Univ, Dept Elect Engn, Tainan 70101, Taiwan
[2] Land Mark Optoelect Corp, Yung Kang, Taiwan
关键词
delta-doped; HBT; HEBT; offset voltage; NDR;
D O I
10.1016/S0254-0584(99)00029-2
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Three types of InGaP/GaAs heterojunction-emitter bipolar transistors (HEBTs) have been grown by low-pressure metalorganic chemical vapor deposition. The current gains are 18, 40, and 55 for the conventional, single delta-doped, and double delta-doped HEBTs, respectively. Moreover, the offset voltage of the double delta-doped structure is as low as 70 mV. Experimental results demonstrated that the current gain and offset voltage can be improved by using the delta-doped emitter structure and undoped spacers on both sides of the base. (C) 1999 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:91 / 95
页数:5
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