Thermally Induced Desulfurization: Structural Transformation of Thiophene on the Si(100) Surface

被引:10
作者
Park, Jinwoo [1 ,2 ]
Lee, Han-Koo [3 ]
Soon, Aloysius [4 ]
Yu, B. D. [5 ]
Hong, Suklyun [1 ,2 ]
机构
[1] Sejong Univ, Dept Phys, Seoul 143747, South Korea
[2] Sejong Univ, Graphene Res Inst, Seoul 143747, South Korea
[3] Pohang Accelerator Lab, Beamline Res Div, Kyungbuk 790784, South Korea
[4] Yonsei Univ, Dept Mat Sci & Engn, Seoul 120749, South Korea
[5] Univ Seoul, Dept Phys, Seoul 130743, South Korea
基金
新加坡国家研究基金会;
关键词
PHOTOELECTRON-SPECTROSCOPY; FURAN; PSEUDOPOTENTIALS; MOLECULES;
D O I
10.1021/jp306495k
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We investigated the bonding structures of thiophene molecules adsorbed on the Si(100)-2 x 1 surface at 300 K and its evolution upon annealing by employing core level photoemission spectroscopy, near-edge X-ray absorption fine structure (NEXAFS), and ab initio calculations. The C 1s and S 2p core-level spectra measured at three different temperatures, 300, 350, and 400 K, are consistently interpreted in terms of the following structures suggested by theoretical calculations: the 2,3- and 2,5-dihydrothiophene (DHT), twisted 2,3- and 2,5-DHT, tetrahydrothiophene (THT), twisted THT, and the desulfurization and twisted desulfurization where the sulfur atom is dissociated from the thiophene ring. We find significantly enhanced desulfurization of thiophene molecules by mild thermal annealing, which is explained by new pathways between desulfurization and other structures.
引用
收藏
页码:11731 / 11737
页数:7
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