Thermal stability studies of ion beam sputter deposited C/B4C X-ray multilayer mirror

被引：5
|
作者：
Rao, P. N. [1 ]
Modi, M. H. [1 ]
Rai, S. K. [1 ]
Sathe, V. G. [2 ]
Deb, S. K. [1 ]
Lodha, G. S. [1 ]
机构：
[1] Raja Ramanna Ctr Adv Technol, Ind Synchrotrons Utilizat Div, Xray Opt Sect, Indore 452013, Madhya Pradesh, India
[2] UGC DAE Consortium Sci Res, Indore 452001, Madhya Pradesh, India
来源：
THIN SOLID FILMS | 2013年 / 527卷
关键词：
X-ray multilayer; Thermal stability; Soft X-ray reflectivity; Raman spectroscopy; X-ray optics; Synchrotron radiation; INDUCED STRUCTURAL MODIFICATION; EXTREME-ULTRAVIOLET; PHOTOABSORPTION; METAL/AL2O3; REFLECTION; SCATTERING; OPTICS; FILMS; OXIDE;
D O I：
10.1016/j.tsf.2012.12.033
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
We report the results of thermal stability study carried out on C/B4C multilayer structure. We have analyzed the structure of as-deposited and vacuum annealed C/B4C multilayer film by soft X-ray reflectivity measurements. We observed that multilayer period expansion continues till 600 degrees C and slight contraction at higher annealing temperature. The results show that the multilayer structure is stable even after 700 degrees C annealing. Raman spectroscopy indicates graphitization of carbon layerwith increasing annealing temperature. Graphitization of carbon results in increases of layer thickness and decreases in density as also observed by soft X-ray reflectivity. We observed reduction in measured soft X-ray reflectivity at 6.56 and 4.39 nm wavelengths after 800 degrees C annealing. C/B4C multilayer structure has been tested over a period of one year to investigate its temporal stability. (C) 2012 Elsevier B. V. All rights reserved.
引用
收藏
页码：244 / 249
页数：6
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