The effect of annealing on hardness, residual stress, and fracture resistance determined by modulation ratios of TiB2/TiAlN multilayers

被引:25
作者
Sun, Y. D. [1 ]
Li, D. J. [1 ]
Gao, C. K. [1 ]
Wang, N. [1 ]
Yan, J. Y. [1 ]
Dong, L. [1 ]
Cao, M. [1 ]
Deng, X. Y. [1 ]
Gu, H. Q. [2 ,3 ]
Wan, R. X. [2 ,3 ]
机构
[1] Tianjin Normal Univ, Coll Phys & Elect Informat Sci, Tianjin 300387, Peoples R China
[2] Tianjin Med Univ, Tianjin Inst Urol Surg, Tianjin 300070, Peoples R China
[3] Shanghai Jiao Tong Univ, Sch Med, Peoples Hosp 9, Shanghai 200011, Peoples R China
关键词
TiB2/TiAlN multilayer; Ion beam assisted deposition; Modulation ratio; Annealing; Hardness; TRIBOLOGICAL PROPERTIES; MECHANICAL-PROPERTIES; THERMAL-STABILITY; COATINGS; SUPERHARD; DEPOSITION; TEMPERATURE; FILMS;
D O I
10.1016/j.surfcoat.2012.05.086
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Nanostructured multilayers of TiB2/TiAlN at different modulation ratios (t(TiB2):t(TAIN)) ranging from 1:24 to 6:1 were deposited onto Si(100) wafers by ion beam assisted deposition (IBAD). The multilayers were subsequently annealed in a vacuum environment at a temperature of 500 degrees C for 30 min, and then characterized by extensive measurements including X-ray reflection (XRR), X-ray diffraction (XRD), scanning electron microscopy (SEM), nano-indentation and surface profilometry. It was found that the mechanical properties of the multilayers were closely related to t(TiB2):t(TAIN). A maximum hardness of 37 GPa was achieved at t(TiB2):t(TAIN) of 1:18 for as-deposited TiB2/TiAlN multilayer. This hardest multilayer also showed the improved residual stress and fracture resistance. The hardness and elastic modulus of the multilayers increased significantly after annealing. The maximum hardness of the multilayer at t(TiB2):t(TAIN) of 1:14 was up to 41 GPa after annealing at 500 degrees C. (C) 2012 Elsevier B.V. All rights reserved.
引用
收藏
页码:S385 / S388
页数:4
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