共 50 条
Mn-doped amorphous Si:H films with anomalous Hall effect up to 150 K
被引:15
|作者:
Yao, Jia-Hsien
[1
]
Li, Shin-Chih
[1
]
Lan, Ming-Der
[2
]
Chin, Tsung-Shune
[1
,3
,4
]
机构:
[1] Natl Tsing Hua Univ, Dept Mat Sci & Engn, Hsinchu 30013, Taiwan
[2] Natl Chung Hsing Univ, Dept Phys, Taichung 40227, Taiwan
[3] Feng Chia Univ, Dept Mat Sci & Engn, Taichung 40724, Taiwan
[4] Natl Appl Res Labs, Natl Nanodevices Lab, Hsinchu 30078, Taiwan
关键词:
amorphous semiconductors;
carrier density;
Curie temperature;
elemental semiconductors;
ferromagnetic materials;
Hall effect;
hydrogen;
hydrogenation;
magnetic susceptibility;
magnetic thin films;
magnetisation;
manganese;
semiconductor growth;
semiconductor thin films;
semimagnetic semiconductors;
silicon;
spin waves;
sputter deposition;
transmission electron microscopy;
X-ray diffraction;
SEMICONDUCTOR;
D O I:
10.1063/1.3089247
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
Structural, magnetic, and electrical properties were investigated of Mn-doped amorphous silicon films prepared by magnetron sputtering with and without hydrogen. Ferromagnetism at room temperature was observed and no clusters or second phases were detected from x-ray diffraction and high-resolution transmission electron microscopy analyses. Hydrogenation enhances saturation magnetization, carrier concentration, and Curie temperature by about 500%, 300%-500%, and 100 K, respectively. The M-T curve of hydrogenated sample fits very well by combination of Curie-Weiss law and three-dimensional spin-wave. Anomalous Hall effect was reproducibly obtained at 150 K. These suggest that the origin of ferromagnetism may arise from the carrier mediated mechanism.
引用
收藏
页数:3
相关论文