Mn-doped amorphous Si:H films with anomalous Hall effect up to 150 K

被引:15
|
作者
Yao, Jia-Hsien [1 ]
Li, Shin-Chih [1 ]
Lan, Ming-Der [2 ]
Chin, Tsung-Shune [1 ,3 ,4 ]
机构
[1] Natl Tsing Hua Univ, Dept Mat Sci & Engn, Hsinchu 30013, Taiwan
[2] Natl Chung Hsing Univ, Dept Phys, Taichung 40227, Taiwan
[3] Feng Chia Univ, Dept Mat Sci & Engn, Taichung 40724, Taiwan
[4] Natl Appl Res Labs, Natl Nanodevices Lab, Hsinchu 30078, Taiwan
关键词
amorphous semiconductors; carrier density; Curie temperature; elemental semiconductors; ferromagnetic materials; Hall effect; hydrogen; hydrogenation; magnetic susceptibility; magnetic thin films; magnetisation; manganese; semiconductor growth; semiconductor thin films; semimagnetic semiconductors; silicon; spin waves; sputter deposition; transmission electron microscopy; X-ray diffraction; SEMICONDUCTOR;
D O I
10.1063/1.3089247
中图分类号
O59 [应用物理学];
学科分类号
摘要
Structural, magnetic, and electrical properties were investigated of Mn-doped amorphous silicon films prepared by magnetron sputtering with and without hydrogen. Ferromagnetism at room temperature was observed and no clusters or second phases were detected from x-ray diffraction and high-resolution transmission electron microscopy analyses. Hydrogenation enhances saturation magnetization, carrier concentration, and Curie temperature by about 500%, 300%-500%, and 100 K, respectively. The M-T curve of hydrogenated sample fits very well by combination of Curie-Weiss law and three-dimensional spin-wave. Anomalous Hall effect was reproducibly obtained at 150 K. These suggest that the origin of ferromagnetism may arise from the carrier mediated mechanism.
引用
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页数:3
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