Hillock-free and atomically smooth InSb QWs grown on GaAs substrates by MBE

被引:6
作者
Shi, Y. [1 ]
Bergeron, E. [1 ,4 ]
Sfigakis, F. [3 ,4 ]
Baugh, J. [1 ,3 ,4 ]
Rwasilewski, Z. [1 ,2 ,4 ,5 ]
机构
[1] Univ Waterloo, Dept Phys & Astron, 200 Univ Ave W, Waterloo, ON N2L 3G1, Canada
[2] Univ Waterloo, Dept Elect & Comp Engn, 200 Univ Ave W, Waterloo, ON N2L 3G1, Canada
[3] Univ Waterloo, Dept Chem, 200 Univ Ave W, Waterloo, ON N2L 3G1, Canada
[4] Univ Waterloo, Inst Quantum Comp, 200 Univ Ave W, Waterloo, ON N2L 3G1, Canada
[5] Univ Waterloo, Waterloo Inst Nanotechnol, 200 Univ Ave W, Waterloo, ON N2L 3G1, Canada
基金
加拿大自然科学与工程研究理事会;
关键词
Surface morphology; Substrate offcut; Spiral growth; InSb QW; Metamorphic buffer; NANOWIRE;
D O I
10.1016/j.jcrysgro.2019.02.039
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Comprehensive studies on the surface morphological evolution of AlInSb metamorphic buffers and InSb QWs grown on top were conducted as a function of the GaAs (001) substrate offcut angles. We confirmed our earlier postulation that the vicinal surfaces defined by the hillock facets have the exact surface orientation needed to achieve large-area hillock-free surfaces. The related morphological transitions were discussed with a graphic illustration. The optimum substrate offcut for InSb towards [(1) over bar 10] direction was found to be around 0.5-0.6 degrees with our growth conditions. On 2-inch GaAs (001) substrates with this offcut, a hillock-free and atomically smooth surface morphology was successfully achieved for modulation-doped InSb QWs.
引用
收藏
页码:15 / 19
页数:5
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