Tin-incorporated nanostructured copper indium oxide delafossite thin films: Structural, electrical and optical analysis

被引:8
作者
Nair, Bindu G. [1 ]
Joseph, Julie Ann [1 ]
Kellner, Z. T. [2 ]
Sharma, Vikash [3 ]
Remillard, S. K. [2 ]
DeYoung, P. A. [2 ]
Okram, G. S. [3 ]
Ganesan, V. [3 ]
Philip, Rachel Reena [1 ]
机构
[1] Union Christian Coll, Thin Film Res Lab, Aluva, Kerala, India
[2] Hope Coll, Dept Phys, Holland, MI 49423 USA
[3] UGC DAE Consortium Sci Res, Khandwa Rd, Indore 452001, Mp, India
关键词
Thin films; Delafossite; X-ray diffraction; Electrical conductivity; Transmittance; Optical band gap; TRANSPARENT CONDUCTING OXIDES; PULSED-LASER DEPOSITION; BIPOLAR CUINO2; FABRICATION; GROWTH; SIZE;
D O I
10.1016/j.jallcom.2018.02.305
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Single phase polycrystalline Sn-doped CuInO2 thin films are prepared by the oxygen plasma enhanced reactive evaporation method. X-ray diffraction indicates a preferential orientation of crystallites along the (006) plane on doping while energy dispersive analysis of X-rays and atomic force microscopy are employed to appraise the composition and morphology of the films, respectively. Remarkably, about 2-3 orders of magnitude enhancement in their electrical conductivity than that reported till date is observed. Further, the Sn-doped thin films possess 2-3 orders of magnitude higher carrier concentration (10(18)-10(19)/cm(3)) than undoped films that is associated with a drastic reduction in mobility. Moreover, different conduction mechanisms possible at different temperature regions ranging from around 55 Ke450 K are studied in detail. While the transparency of the films is increased from 43% to 85% on doping, the optical band gap decreases from 3.83 eV to 3.5 eV. (c) 2018 Elsevier B.V. All rights reserved.
引用
收藏
页码:435 / 444
页数:10
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