Evidence for H2* trapped by carbon impurities in silicon

被引:22
作者
Hourahine, B
Jones, R
Öberg, S
Briddon, PR
Markevich, VP
Newman, RC
Hermansson, J
Kleverman, M
Lindström, JL
Murin, LI
Fukata, N
Suezawa, M
机构
[1] Univ Exeter, Sch Phys, Exeter EX4 4QL, Devon, England
[2] Lulea Univ Technol, Dept Math, S-97187 Lulea, Sweden
[3] Newcastle Univ, Dept Phys, Newcastle Upon Tyne NE1 7RU, Tyne & Wear, England
[4] Univ Manchester, Ctr Elect Mat, Manchester M60 1QD, Lancs, England
[5] Inst Solid State & Semicond Phys, Minsk 220072, BELARUS
[6] Univ London Imperial Coll Sci Technol & Med, Ctr Elect Mat Devices, Blacket Lab, Dept Phys, London SW7 2BZ, England
[7] Lund Univ, Dept Phys, S-22100 Lund, Sweden
[8] Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, Japan
关键词
silicon; hydrogen; carbon; impurity complexes; absorption bands;
D O I
10.1016/S0921-4526(01)00719-0
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Local mode spectroscopy and ab initio modelling are used to investigate two trigonal defects found in carbon-rich Si into which H had been in-diffused. Isotopic shifts with D and C-13 are reported along with the effect of uniaxial stress. Ab initio modelling studies suggest that the two defects are two forms of the CH2* complex where one of the two hydrogen atoms lies at an anti-bonding site attached to C or Si, respectively. The two structures are nearly degenerate and possess vibrational modes in good agreement with those observed. (C) 2001 Elsevier Science B,V, All rights reserved.
引用
收藏
页码:197 / 201
页数:5
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