Dependence of Nitrogen/Argon Reaction Gas Amount on Structural, Mechanical and Optical Properties of Thin WNx Films

被引:4
作者
Asgary, Somayeh [1 ]
Ramezani, Amir Hoshang [1 ]
机构
[1] Islamic Azad Univ, West Tehran Branch, Dept Phys, Tehran, Iran
关键词
TUNGSTEN NITRIDE COATINGS; THERMAL-STABILITY; TRIBOLOGICAL CHARACTERIZATION; MOLYBDENUM NITRIDE; TEMPERATURE; DEPOSITION; MICROSTRUCTURES; TRANSITION; COLUMNAR; GROWTH;
D O I
10.1088/0256-307X/34/12/126801
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
WNx films are deposited by reactive chemical vapor deposition at different amounts of nitrogen in gas mixtures. Experimental data demonstrate that nitrogen amount has a strong effect on microstructure, phase formation, texture morphology, mechanical and optical properties of the WNx films. With increasing nitrogen a phase transition from a single WN phase with low crystallinity structure to a well-mixed crystallized hexagonal WN and face-centered-cubic W2N phases appears. Relatively smooth morphology at lower N-2 concentration changes to a really smooth morphology and then granular with coarse surface at higher N-2 concentration. The SEM observation clearly shows a columnar structure at lower N-2 concentration and a dense nanoplates one for higher nitrogen content. The hardness of WN thin films mainly depends on the film microstructure. The absorbance peak position shifts to shorter wavelength continuously with increasing nitrogen amount and decreasing particle size.
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页数:5
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