Vacancy compensation and related donor-acceptor pair recombination in bulk AlN

被引:84
作者
Gaddy, Benjamin E. [1 ]
Bryan, Zachary [1 ]
Bryan, Isaac [1 ]
Kirste, Ronny [1 ]
Xie, Jinqiao [2 ]
Dalmau, Rafael [2 ]
Moody, Baxter [2 ]
Kumagai, Yoshinao [3 ]
Nagashima, Toru [4 ]
Kubota, Yuki [4 ]
Kinoshita, Toru [4 ]
Koukitu, Akinori [3 ]
Sitar, Zlatko [1 ]
Collazo, Ramon [1 ]
Irving, Douglas L. [1 ]
机构
[1] N Carolina State Univ, Dept Mat Sci & Engn, Raleigh, NC 27695 USA
[2] HexaTech Inc, Morrisville, NC 27560 USA
[3] Tokyo Univ Agr & Technol, Dept Appl Chem, Koganei, Tokyo 1848588, Japan
[4] Tokuyama Corp, Tsukuba Res Labs, Tsukuba, Ibaraki 3004247, Japan
关键词
INITIO MOLECULAR-DYNAMICS; TOTAL-ENERGY CALCULATIONS; SEEDED GROWTH; SEMICONDUCTORS; CRYSTALS; DEFECT;
D O I
10.1063/1.4824731
中图分类号
O59 [应用物理学];
学科分类号
摘要
A prominent 2.8 eV emission peak is identified in bulk AlN substrates grown by physical vapor transport. This peak is shown to be related to the carbon concentration in the samples. Density functional theory calculations predict that this emission is caused by a donor-acceptor pair (DAP) recombination between substitutional carbon on the nitrogen site and a nitrogen vacancy. Photoluminescence and photoluminescence-excitation spectroscopy are used to confirm the model and indicate the DAP character of the emission. The interaction between defects provides a pathway to creating ultraviolet-transparent AlN substrates for optoelectronics applications. (C) 2013 AIP Publishing LLC.
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页数:5
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