Novel partially depleted SOI MOSFET for suppression floating-body effect: An embedded JFET structure

被引:12
作者
Orouji, Ali A. [1 ]
Abbasi, Abdollah [1 ]
机构
[1] Semnan Univ, Dept Elect Engn, Semnan, Iran
关键词
Silicon-on-insulator; Floating-body effect; SiGe; Simulation; BIPOLAR-INDUCED BREAKDOWN; ELIMINATION; TRANSISTOR;
D O I
10.1016/j.spmi.2012.06.006
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Silicon-on-insulator (SOI) devices have an inherent floating body effect which may cause substantial influences in the performance of SOI devices and circuits. In this paper we propose a novel device structure to suppress the floating body effect by using an embedded junction field effect transistor (JFET). The key idea in this work is to provide a path for accumulated holes to flow out of the body to improving of electrical performance. We have introduced a p(+)-Si1-xGex buried region under the n(+)-Si1-xGex source and called the proposed structure as embedded JFET SOI MOSFET (EJFET-SOI). Using two-dimensional two-carrier simulation, the output and subthreshold characteristics of EJFET-SOI are compared with those of conventional SOI counterparts. The simulated results show the suppression of floating body effect in the EJFET-SOI structure as expected without consuming a significant amount of area. (C) 2012 Elsevier Ltd. All rights reserved.
引用
收藏
页码:552 / 559
页数:8
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