Avalanche photodiode punch-through gain determination through excess noise analysis

被引:24
|
作者
Liu, Han-Din [1 ]
Pan, Huapu [1 ]
Hu, Chong [1 ]
McIntosh, Dion [1 ]
Lu, Zhiwen [1 ]
Campbell, Joe [1 ]
Kang, Yimin [2 ]
Morse, Mike [2 ]
机构
[1] Univ Virginia, Charlottesville, VA 22904 USA
[2] Intel Corp, Santa Clara, CA 95054 USA
关键词
SILICON;
D O I
10.1063/1.3226659
中图分类号
O59 [应用物理学];
学科分类号
摘要
A new approach to determine the multiplication gain at punch-through for an avalanche photodiode with separate absorption and multiplication regions from excess noise measurement is discussed. Correctly determining the gain at punch-through is crucial for characterizing performance parameters of this type of avalanche photodiode. In order to illustrate the viability of this technique, in this work, a Ge on Si avalanche photodiode is analyzed. At a punch-through bias of 15 V, the multiplication gain was determined to be similar to 1.54 while a simulation based on the device structure yielded a punch-through gain of 1.65. (C) 2009 American Institute of Physics. [doi:10.1063/1.3226659]
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页数:4
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