Secondary Electron Generation in Electron-beam-irradiated Solids: Resolution Limits to Nanolithography

被引：8

作者：

Lee, Kyu Won ^{[1
,2
]}

Yoon, S. M. ^{[1
,2
]}

Lee, S. C. ^{[1
,2
]}

Lee, W. ^{[1
,2
]}

Kim, I. -M. ^{[1
,2
]}

Lee, Cheol Eui ^{[1
,2
]}

Kim, D. H. ^{[3
]}

机构：

[1] Korea Univ, Dept Phys, Seoul 136713, South Korea

[2] Korea Univ, Inst Nano Sci, Seoul 136713, South Korea

[3] Seoul Natl Univ Technol, Seoul 139743, South Korea

来源：

JOURNAL OF THE KOREAN PHYSICAL SOCIETY | 2009年 / 55卷 / 04期

关键词：

Electron-beam nanolithography; Secondary electron generation; Monte Carlo simulation; LITHOGRAPHY; SIMULATION; POLYMETHYLMETHACRYLATE;

D O I：

10.3938/jkps.55.1720

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

We have investigated the secondary electron generation in electron-beam-irradiated solids by means of a Monte Carlo simulation. The slow secondary electron energy was found to be independent of the position and the incident energy of the electron beam, and the electron beam broadening in thin films due to secondary electrons was found to be at least 5-10 nm, setting limits to the nanolithographic resolution.

引用

页码：1720 / 1723

页数：4

共 11 条

[1] Simulation of the spatial distribution and molecular weight of polymethylmethacrylate fragments in electron beam lithography exposures [J].

Aktary, M ;

Stepanova, M ;

Dew, SK .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2006, 24 (02) :768-779

[2] REEVALUATION OF X-RAY ATOMIC ENERGY LEVELS [J].

BEARDEN, JA ;

BURR, AF .

REVIEWS OF MODERN PHYSICS, 1967, 39 (01) :125-&

[3] CLASSICAL THEORY OF ATOMIC COLLISIONS .I. THEORY OF INELASTIC COLLISIONS [J].

GRYZINSKI, M .

PHYSICAL REVIEW, 1965, 138 (2A) :A336-+

[4] Chain-ordering effect on poly(3-hexylthiophene)-based solar cells [J].

Lee, Y. H. ;

Oh, I. H. ;

Lee, K. W. ;

Yoon, S. M. ;

Lee, Cheol Eui .

JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2007, 51 (04) :1457-1459

[5] Proton Conduction in KH2PO4 Modified by Proton Irradiation [J].

Oh, In-Hwan ;

Kweon, Jin Jung ;

Oh, B. H. ;

Lee, Cheol Eui .

JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2008, 53 (06) :3497-3499

[6] THEORETICAL-STUDY OF THE ULTIMATE RESOLUTION IN ELECTRON-BEAM LITHOGRAPHY BY MONTE-CARLO SIMULATION, INCLUDING SECONDARY-ELECTRON GENERATION - ENERGY-DISSIPATION PROFILE IN POLYMETHYLMETHACRYLATE [J].

SAMOTO, N ;

SHIMIZU, R .

JOURNAL OF APPLIED PHYSICS, 1983, 54 (07) :3855-3859

[7] MONTE-CARLO APPROACH TO DIRECT SIMULATION OF ELECTRON PENETRATION IN SOLIDS [J].

SHIMIZU, R ;

KATAOKA, Y ;

IKUTA, T ;

KOSHIKAWA, T ;

HASHIMOTO, H .

JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1976, 9 (01) :101-114

[8] MONTE-CARLO MODELING OF ELECTRON-SOLID INTERACTIONS [J].

SHIMIZU, R ;

DING, ZJ .

REPORTS ON PROGRESS IN PHYSICS, 1992, 55 (04) :487-531

[9] MONTE-CARLO CALCULATIONS OF KEV ELECTRON AND POSITRON SLOWING DOWN IN SOLIDS [J].

VALKEALAHTI, S ;

NIEMINEN, RM .

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1983, 32 (02) :95-106

[10] Energy deposition and transfer in electron-beam lithography [J].

Wu, B ;

Neureuther, AR .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2001, 19 (06) :2508-2511

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