Improving the acousto-optical interaction by an introduction of a planarisation SiO2 layer

被引:1
作者
Wang, Rongwei [1 ]
Fan, Guofang [1 ]
Zhang, Zeping [1 ]
Jing, Yachao [1 ]
Wang, Muguang [1 ]
Cai, Xiaoyu [2 ]
Wei, Jiasi [2 ]
Li, Hongyu [3 ]
Li, Yuan [2 ]
机构
[1] Beijing Jiaotong Univ, Inst Lightwave Technol, Key Lab All Opt Network & Adv Telecommun Network, Beijing, Peoples R China
[2] Natl Ctr Testing Technol, Natl Ctr Measurement & Testing East China, Shanghai Inst Measurement & Testing Technol, Shanghai, Peoples R China
[3] Shandong Univ Sci & Technol, Coll Mech & Elect Engn, Qingdao, Peoples R China
基金
国家重点研发计划;
关键词
WAVE; DEVICES; MODULATION; LIGHT;
D O I
10.1049/ell2.12013
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper introduces a planarisation SiO2 layer into the configuration of ZnO-silicon-on-insulator for constructing an acoustical resonant cavity to enhance the acoustic density on a silicon-on-insulator waveguide. The improved configuration with a planarisation SiO2 layer can increase the acousto-optical interaction by about three times and 20% compared with acousto-optical configuration of ZnO pads only in an interdigital transducer region and all over a silicon on insulator. Moreover, an introduction of a planarisation SiO2 layer can reduce acoustic reflection on optical waveguide and optical waveguide loss for an acousto-optical device on silicon-on-insulator optical waveguides.
引用
收藏
页码:223 / 225
页数:3
相关论文
共 49 条
  • [41] Reliability of Quasi-vertical GaN on Silicon Schottky Barrier Diodes With SiO2 Passivation Layer Under On-State Stress Bias
    Lin, Ya-Xun
    Chao, Der-Sheng
    Liang, Jenq-Horng
    Shen, Yao-Luen
    Huang, Chih-Fang
    Hall, Steve
    Mitrovic, Ivona Z.
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2024, 71 (09) : 5296 - 5304
  • [42] Raman microscopy and infrared optical properties of SiGe Mie resonators formed on SiO2 via Ge condensation and solid state dewetting
    Poborchii, Vladimir
    Bouabdellaoui, Mohammed
    Uchida, Noriyuki
    Ronda, Antoine
    Berbezier, Isabelle
    David, Thomas
    Ruiz, Carmen M.
    Zazoui, Mimoun
    Sena, Robert Paria
    Abbarchi, Marco
    Favre, Luc
    NANOTECHNOLOGY, 2020, 31 (19)
  • [43] High-temperature optical properties of sensitized Er3+ in Si-rich SiO2 - implications for gain performance
    Savchyn, Oleksandr
    Todi, Ravi M.
    Coffey, Kevin R.
    Kik, Pieter G.
    OPTICAL MATERIALS, 2010, 32 (09) : 1274 - 1278
  • [44] Effects of post-metallisation annealing on surface-interfacial and electrical properties of HfO2/Ge stacks modified in situ with SiO2 interfacial layer
    Mallem, Kumar
    Ju, Minkyu
    Narayana, Ashwath
    Chodary, Sanchari
    Kim, Jaemin
    Park, Jinsu
    Kim, Seyoun
    Lokesh, S., V
    Kumar, M. V. Ravi
    Kim, Youngkuk
    Cho, Eun-Chel
    Yi, Junsin
    MATERIALS RESEARCH EXPRESS, 2019, 6 (08)
  • [45] Comparative Study of P2 1D-FFPC Containing Dielectric, SiO2 and TiO2 Materials and Air/TiO2 P2 1-D FFPC For Micro-Cavities and Ultra Sensitive Optical Sensors
    Singh, Prabal Pratap
    Chandel, Vishal Singh
    Thapa, Khem Bahadur
    2018 INTERNATIONAL CONFERENCE ON SUSTAINABLE ENERGY, ELECTRONICS, AND COMPUTING SYSTEMS (SEEMS), 2018,
  • [46] Enhanced electrical stability of flexible indium tin oxide films prepared on stripe SiO2 buffer layer-coated polymer substrates by magnetron sputtering
    Yu, Zhi-nong
    Zhao, Jian-jian
    Xia, Fan
    Lin, Ze-jiang
    Zhang, Dong-pu
    Leng, Jian
    Xue, Wei
    APPLIED SURFACE SCIENCE, 2011, 257 (11) : 4807 - 4810
  • [47] Tailored Highly Transparent Composite Hole-Injection Layer Consisting of Pedot:PSS and SiO2 Nanoparticles for Efficient Polymer Light-Emitting Diodes
    Riedel, Boris
    Shen, Yuxin
    Hauss, Julian
    Aichholz, Markus
    Tang, Xiaochen
    Lemmer, Uli
    Gerken, Martina
    ADVANCED MATERIALS, 2011, 23 (06) : 740 - +
  • [48] Charge Storage Capabilities of (a/nc) Si Embedded in SiOx Matrix and the Influence of Tunneling Layer Thickness of SiO2/(a/nc) Si-SiOx/SiOxNy Stack on the Memory Performances of MIS Structure
    Thanh Thuy Trinh
    Shin, Chonghoon
    Cam Phu Thi Nguyen
    Jang, Kyungsoo
    Van Duy Nguyen
    Lee, Jae Hyeong
    Vinh Ai Dao
    Yi, Junsin
    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2017, 17 (05) : 3210 - 3216
  • [49] Theoretical study of the atomistic behavior of O vacancy complexes with N and H atoms in the SiO2 layer of a metal-oxide-nitride-oxide-semiconductor memory: Physical origin of the irreversible threshold voltage shift observed in metal-oxide-nitride-oxide-semiconductor memories
    Shirakawa, Hiroki
    Araidai, Masaaki
    Kamiya, Katsumasa
    Shiraishi, Kenji
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2018, 57 (08)