Abatement and toxicity reduction of antimicrobials by UV/H2O2 process

被引：17

作者：

Urbano, Vanessa Ribeiro ^{[1
]}

Peres, Marcela Souza ^{[1
]}

Maniero, Milena Guedes ^{[1
]}

Guimaraes, Jose Roberto ^{[1
]}

机构：

[1] Univ Estadual Campinas, Sch Civil Engn Architecture & Urban Design, POB 6143, BR-13083889 Campinas, SP, Brazil

来源：

JOURNAL OF ENVIRONMENTAL MANAGEMENT | 2017年 / 193卷

基金：

巴西圣保罗研究基金会;

关键词：

Advanced oxidation process; Antimicrobial activity; Ofloxacin; Peroxidation; Photolysis; Sulfaquinoxaline; PHOTO-FENTON; WASTE-WATER; SPECTROPHOTOMETRIC DETERMINATION; QUINOLONE ANTIBACTERIALS; EMERGING CONTAMINANTS; DEGRADATION; OFLOXACIN; PHARMACEUTICALS; ANTIBIOTICS; REMOVAL;

D O I：

10.1016/j.jenvman.2017.02.028

中图分类号：

X [环境科学、安全科学];

学科分类号：

08 ; 0830 ;

摘要：

Antimicrobials are continuously detected in environmental waters and their removal is important to avoid health and microorganisms damage. In this work, the peroxidation assisted by ultraviolet radiation (UV/H2O2) was studied to verify if the process was able to degrade sulfaquinoxaline and ofloxacin antimicrobials and to remove the toxicity and the antimicrobial activity of the solution. This process was effective on degradation of the antimicrobials, despite the antimicrobial activity removal, the toxicity of the solution increased throughout the reaction time. (C) 2017 Elsevier Ltd. All rights reserved.

引用

页码：439 / 447

页数：9

共 48 条

[1] Estimation of kinetic parameters and UV doses necessary to remove twenty-three pharmaceuticals from pre-treated urban wastewater by UV/H2O2 [J].