Impact of proton irradiation on dc performance of AlGaN/GaN high electron mobility transistors

被引:29
作者
Liu, Lu [1 ]
Cuervo, Camilo Velez [1 ]
Xi, Yuyin [1 ]
Ren, Fan [1 ]
Pearton, Stephen J. [2 ]
Kim, Hong-Yeol [3 ]
Kim, Jihyun [3 ]
Kravchenko, Ivan I. [4 ]
机构
[1] Univ Florida, Dept Chem Engn, Gainesville, FL 32611 USA
[2] Univ Florida, Dept Mat Sci & Engn, Gainesville, FL 32611 USA
[3] Korea Univ, Dept Chem & Biol Engn, Seoul 136713, South Korea
[4] Oak Ridge Natl Lab, Ctr Nanophase Mat Sci, Oak Ridge, TN 37830 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2013年 / 31卷 / 04期
基金
新加坡国家研究基金会;
关键词
NATIVE DEFECTS;
D O I
10.1116/1.4813785
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The effects of high energy proton irradiation dose on dc performance as well as critical voltage of the drain-voltage step-stress of AlGaN/GaN high electron mobility transistors (HEMTs) were investigated to evaluate the feasibility of AlGaN/GaN HEMTs for space applications, which need to stand a variety of irradiations. The HEMTs were irradiated with protons at a fixed energy of 5 MeV and doses ranging from 10(9) to 2 X 10(14) cm(-2). For the dc characteristics, there was only minimal degradation of saturation drain current (I-DSS), transconductance (g(m)), electron mobility, and sheet carrier concentration at doses below 2 x 10(13) cm(-2), while the reduction of these parameters were 15%, 9%, 41% and 16.6%, respectively, at a dose of 2 x 10(14) cm(-2). At this same dose condition, increases of 37% in drain breakdown voltage (V-BR) and of 45% in critical voltage (V-cri) were observed. The improvements of drain breakdown voltage and critical voltage were attributed to the modification of the depletion region due to the introduction of a higher density of defects after irradiation at a higher dose. (C) 2013 American Vacuum Society.
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页数:6
相关论文
共 22 条
[21]   Radiation effects in GaN materials and devices [J].
Polyakov, Alexander Y. ;
Pearton, S. J. ;
Frenzer, Patrick ;
Ren, Fan ;
Liu, Lu ;
Kim, Jihyun .
JOURNAL OF MATERIALS CHEMISTRY C, 2013, 1 (05) :877-887
[22]   Ti/Al/Ni/Au Ohmic contacts for AlInN/AlN/GaN-based heterojunction field-effect transistors [J].
Zhou, Lin ;
Leach, Jacob H. ;
Ni, Xianfeng ;
Morkoccedil, Hadis ;
Smith, David J. .
JOURNAL OF APPLIED PHYSICS, 2010, 107 (01)