Effect of the deposition gas pressure on the structure and mechanical stability of sputtered amorphous carbon nitride films

被引：3

作者：

Peponas, S. ^{[1
]}

Lejeune, M. ^{[1
]}

Charvet, S. ^{[1
]}

Guedda, M. ^{[2
]}

Benlahsen, M. ^{[1
]}

机构：

[1] Lab Phys Matiere Condensee, F-80039 Amiens 2, France

[2] CNRS, UMR 6140, Lab Amienois Math Fdn & Appl LAMFA, F-80039 Amiens, France

来源：

SURFACE & COATINGS TECHNOLOGY | 2012年 / 212卷

关键词：

Carbon nitride; Magnetron sputtering; Structure IR optical properties; Buckling delamination; THIN-FILMS; ELECTRICAL-PROPERTIES; BUCKLE DELAMINATION; STRESS; GROWTH;

D O I：

10.1016/j.surfcoat.2012.09.054

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

We present in this study spectroscopic investigations of amorphous carbon nitride thin films (a-CNx) deposited on Si substrate by radio-frequency magnetron sputtering of a graphite target in Ar/N-2 gas mixture, under different deposition gas pressure. The properties of films were determined using atomic force microscopy (AFM), Fourier Transform Infrared measurements, transmission spectroscopy and intrinsic stress measurements. A limiting effect of the terminating bonds and their contamination by water has been examined in relation with optoelectronical and mechanical properties of the films. The appearance of the telephone-cord buckling as an interfacial failure mode has been elucidated and the evolution of their morphological characteristics has been studied in relation with the deposition conditions and the resulting microstructure. (C) 2012 Elsevier B.V. All rights reserved.

引用

页码：229 / 233

页数：5

共 41 条

[31] STRESS RELIEF FORMS OF DIAMOND-LIKE CARBON THIN-FILMS UNDER INTERNAL COMPRESSIVE STRESS [J].