Effect of the deposition gas pressure on the structure and mechanical stability of sputtered amorphous carbon nitride films

被引：3
作者：
Peponas, S. [1 ]
Lejeune, M. [1 ]
Charvet, S. [1 ]
Guedda, M. [2 ]
Benlahsen, M. [1 ]
机构：
[1] Lab Phys Matiere Condensee, F-80039 Amiens 2, France
[2] CNRS, UMR 6140, Lab Amienois Math Fdn & Appl LAMFA, F-80039 Amiens, France
来源：
SURFACE & COATINGS TECHNOLOGY | 2012年 / 212卷
关键词：
Carbon nitride; Magnetron sputtering; Structure IR optical properties; Buckling delamination; THIN-FILMS; ELECTRICAL-PROPERTIES; BUCKLE DELAMINATION; STRESS; GROWTH;
D O I：
10.1016/j.surfcoat.2012.09.054
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
We present in this study spectroscopic investigations of amorphous carbon nitride thin films (a-CNx) deposited on Si substrate by radio-frequency magnetron sputtering of a graphite target in Ar/N-2 gas mixture, under different deposition gas pressure. The properties of films were determined using atomic force microscopy (AFM), Fourier Transform Infrared measurements, transmission spectroscopy and intrinsic stress measurements. A limiting effect of the terminating bonds and their contamination by water has been examined in relation with optoelectronical and mechanical properties of the films. The appearance of the telephone-cord buckling as an interfacial failure mode has been elucidated and the evolution of their morphological characteristics has been studied in relation with the deposition conditions and the resulting microstructure. (C) 2012 Elsevier B.V. All rights reserved.
引用
收藏
页码：229 / 233
页数：5
相关论文
共 41 条
[1]   The effect of moisture on buckle delamination of thin inorganic layers on a polymer substrate [J].
Abdallah, A. A. ;
Bouten, P. C. P. ;
Den Toonder, J. M. J. ;
de With, G. .
THIN SOLID FILMS, 2008, 516 (06) :1063-1073
[2]   Carbon films with an sp2 network structure [J].
Alexandrou, I ;
Scheibe, HJ ;
Kiely, CJ ;
Papworth, AJ ;
Amaratunga, GAJ ;
Schultrich, B .
PHYSICAL REVIEW B, 1999, 60 (15) :10903-10907
[3]   The effect of the terminating bonds on the electronic properties of sputtered carbon nitride thin films [J].
Alibart, F. ;
Peponas, S. ;
Charvet, S. ;
Benlahsen, M. .
THIN SOLID FILMS, 2011, 519 (10) :3430-3436
[4]   Effect of nitrogen on the optoelectronic properties of a highly sp2-rich amorphous carbon nitride films [J].
Alibart, F. ;
Lejeune, M. ;
Zellama, K. ;
Benlahsen, M. .
DIAMOND AND RELATED MATERIALS, 2011, 20 (03) :409-412
[5]   Demonstration of an amorphous carbon tunnel diode [J].
Bhattacharyya, Somnath ;
Silva, S. Ravi P. .
APPLIED PHYSICS LETTERS, 2007, 90 (08)
[6]   Electrical and optical properties of CNx(0≤x≤0.25) films deposited by reactive magnetron sputtering [J].
Broitman, E ;
Hellgren, N ;
Järrendahl, K ;
Johansson, MP ;
Olafsson, S ;
Radnóczi, G ;
Sundgren, JE ;
Hultman, L .
JOURNAL OF APPLIED PHYSICS, 2001, 89 (02) :1184-1190
[7]   Study of nitrogen pressure effect on the laser-deposited amorphous carbon films [J].
Bulir, J ;
Jelinek, M ;
Vorlicek, V ;
Zemek, J ;
Perina, V .
THIN SOLID FILMS, 1997, 292 (1-2) :318-323
[8]   Vibrational properties of carbon nitride films by Raman spectroscopy [J].
Chowdhury, AKMS ;
Cameron, DC ;
Hashmi, MSJ .
THIN SOLID FILMS, 1998, 332 (1-2) :62-68
[9]   Nitrogen effect on the electrical properties of CNx thin films deposited by reactive magnetron sputtering [J].
Derradji, NE ;
Mahdjoubi, ML ;
Belkhir, H ;
Mumumbila, N ;
Angleraud, B ;
Tessier, PY .
THIN SOLID FILMS, 2005, 482 (1-2) :258-263
[10]   Atomic rearrangement of sputtered amorphous carbon nitride thin films during growth [J].
Durand-Drouhin, O ;
Benlahsen, M ;
Clin, M ;
Zellama, K .
DIAMOND AND RELATED MATERIALS, 2004, 13 (10) :1854-1858
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