Electrochromic properties of sputtered Ni oxide thin films in neutral KCl electrolytes

被引：10
作者：
Abe, Y [1 ]
Lee, SH
Zayim, EO
Tracy, CE
Pitts, JR
Deb, SK
机构：
[1] Natl Renewable Energy Lab, Golden, CO 80401 USA
[2] Kitami Inst Technol, Kitami, Hokkaido 0908507, Japan
[3] Istanbul Tech Univ, TR-80626 Istanbul, Turkey
来源：
ELECTROCHEMICAL AND SOLID STATE LETTERS | 2006年 / 9卷 / 01期
关键词：
D O I：
10.1149/1.2137471
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
Thin films of Ni oxide, a promising anodic electrochromic material, were deposited by reactive radio frequency (rf) sputtering at 40, 60, and 100 W, and their electrochemical and electrochromic properties were examined using neutral KCl electrolytes. Higher charge capacity and higher optical modulation were obtained for a Ni oxide film deposited at low sputtering power and low deposition rate. Electrochromic coloration efficiencies of similar to 30 cm(2)/C were obtained for all the Ni oxide films in KCl regardless of rf power value. (c) 2005 The Electrochemical Society. [DOI: 10.1149/1.2137471] All rights reserved.
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收藏
页码：G17 / G18
页数：2
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