Femtosecond laser-induced simultaneous surface texturing and crystallization of a-Si:H thin film: morphology study

被引:11
作者
Wang, Hongliang [1 ]
Kongsuwan, Panjawat [1 ]
Satoh, Gen [1 ]
Yao, Y. Lawrence [1 ]
机构
[1] Columbia Univ, Dept Mech Engn, New York, NY 10027 USA
关键词
Femtosecond laser; Surface texturing; a-Si:H; Thin film; SILICON SOLAR-CELLS; AMORPHOUS-SILICON; REFLECTANCE; MICROSTRUCTURES; EXCIMER; PULSES;
D O I
10.1007/s00170-012-4291-0
中图分类号
TP [自动化技术、计算机技术];
学科分类号
0812 ;
摘要
Hydrogenated amorphous silicon (a-Si:H) thin films have been considered for use in solar cell applications because of their significantly reduced cost compared with crystalline bulk silicon; however, their overall efficiency and stability are less than that of their bulk crystalline counterparts. Limited work has been performed on solving the efficiency and stability issues of a-Si:H simultaneously. Surface texturing and crystallization on a-Si:H thin film can be achieved through one-step femtosecond laser processing, which can potentially alleviate the disadvantages of a-Si:H in solar cell applications. In this study, submicrometer conical and pillar-shaped spikes are fabricated by irradiating a-Si:H thin films deposited on glass substrates with hundreds of 800 nm-wavelength, 130 fs-duration laser pulses in air, and water environments, respectively. The formation mechanisms for the surface spikes are discussed, and the differences in the surface feature characteristics are also presented and explained within the context of the different processing environments. The effect of laser processing on light absorption and crystallinity will be studied later.
引用
收藏
页码:1691 / 1703
页数:13
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