Orientation contrast of secondary electron images from electro-polished metals

被引：2

作者：

Chen, D. ^{[1
]}

Chang, C. P. ^{[1
]}

Loretto, M. H. ^{[2
]}

机构：

[1] Natl Sun Yat Sen Univ, Dept Mat & Optoelect Sci, Res Ctr Phys Properties & Microstruct Met, Kaohsiung 80424, Taiwan

[2] Univ Birmingham, Sch Met & Mat, IRC Mat, Edgbaston B15 2TT, W Midlands, England

来源：

ULTRAMICROSCOPY | 2015年 / 156卷

关键词：

Orientation contrast; Electropolishing; Metals; SEM; MICROSCOPY;

D O I：

10.1016/j.ultramic.2015.05.005

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

Orientation contrast obtained by an in-lens secondary electron detector in a scanning electron microscope from electropolished/etched metals is reported. The imaging conditions for obtaining such orientation contrast are defined. The mechanism responsible for the formation of the orientation contrast is explained, and an application example of this new imaging method is given. (C) 2015 Elsevier B.V. All rights reserved.

引用

页码：41 / 49

页数：9

共 8 条

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