Imaging the dissociation process of O2 background gas during pulsed laser ablation of LiNbO3 -: art. no. 211501

被引:8
作者
Epurescu, G [1 ]
Siegel, J [1 ]
Gonzalo, J [1 ]
Gordillo-Vázquez, FJ [1 ]
Afonso, CN [1 ]
机构
[1] CSIC, Inst Opt, Laser Proc Grp, E-28006 Madrid, Spain
关键词
D O I
10.1063/1.2135884
中图分类号
O59 [应用物理学];
学科分类号
摘要
The dynamics and the reactivity of the plasma produced during pulsed laser ablation of LiNbO3 have been investigated. Optical emission spectroscopy combined with time-gated imaging with high spatial resolution is applied to the study of the factors that influence the plasma expansion process, the dynamics of the ejected species the influence of a background atmosphere (O-2 and Ar) and the reactivity of the expanding plasma. Direct evidence for O-2 dissociation occurring during expansion is presented and the temporal evolution of the spatial distribution of the dissociated O-2 is studied in detail. The influence of dissociation and velocities of the ablated species on the quality of thin films grown by pulsed laser deposition are discussed. (c) 2005 American Institute of Physics.
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页码:1 / 3
页数:3
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