Current status of x-ray mask manufacturing at the microlithographic mask development center

被引：2
|
作者：
Kimmel, KR [1 ]
Hughes, PJ [1 ]
机构：
[1] IBM CORP,MICROELECT DIV,LORAL FED SYST,ESSEX JCT,VT
来源：
PHOTOMASK AND X-RAY MASK TECHNOLOGY III | 1996年 / 2793卷
关键词：
X-ray mask; X-ray lithography; MMD; Microlithographic Mask Development Center;
D O I：
10.1117/12.245250
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
引用
收藏
页码：176 / 187
页数：12
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