The Effects of CF4 Partial Pressure on the Hydrophobic Thin Film Formation on Carbon Steel by Surface Treatment and Coating Method with Linear Microwave Ar/CH4/CF4 Plasma

被引：3

作者：

Han, Moon-Ki ^{[1
]}

Cha, Ju-Hong ^{[1
]}

Lee, Ho-Jun ^{[1
]}

Chang, Cheol Jong ^{[2
]}

Jeon, Chang Yeop ^{[2
]}

机构：

[1] Pusan Natl Univ, Dept Elect & Comp Engn, Busan, South Korea

[2] LG Elect, Prod Res Inst, Seoul, South Korea

来源：

JOURNAL OF ELECTRICAL ENGINEERING & TECHNOLOGY | 2017年 / 12卷 / 05期

基金：

新加坡国家研究基金会;

关键词：

Fluorinated carbon films; a-C:H:F; 2.45GHz microwave plasma; CF4 partial pressure; Carbon steel; Wear-resistivity; Hydrophobicity; durability; CHEMICAL-VAPOR-DEPOSITION; TRIBOLOGICAL PROPERTIES; RF PLASMA; PECVD; POLYMERIZATION; POLYMERS; ESCA;

D O I：

10.5370/JEET.2017.12.5.2007

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

In order to give hydrophobic surface properties on carbon steel, the fluorinated amorphous carbon films were prepared by using linear 2.45GHz microwave PECVD device. Two different process approaches have been tested. One is direct deposition of a-C:H:F films using admixture of Ar/CH4/CF4 working gases and the other is surface treatment using CF4 plasma after deposition of aC:H film with Ar/CH4 binary gas system. Ar/CF4 plasma treated surface with high CF4 gas ratio shows best hydrophobicity and durability of hydrophobicity. Nanometer scale surface roughness seems one of the most important factors for hydrophobicity within our experimental conditions. The properties of aC: H: F films and CF4 plasma treated a-C: H films were investigated in terms of surface roughness, hardness, microstructure, chemical bonding, atomic bonding structure between carbon and fluorine, adhesion and water contact angle by using atomic force microscopy (AFM), nano-indentation, Raman analysis and X-ray photoelectron spectroscopy (XPS).

引用

页码：2007 / 2013

页数：7

共 27 条

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