Latent ion tracks in amorphous silicon

被引:26
作者
Bierschenk, T. [1 ]
Giulian, R. [1 ]
Afra, B. [1 ]
Rodriguez, M. D. [1 ]
Schauries, D. [1 ]
Mudie, S. [2 ]
Pakarinen, O. H. [3 ,4 ,5 ]
Djurabekova, F. [4 ,5 ]
Nordlund, K. [4 ,5 ]
Osmani, O. [6 ,7 ,8 ]
Medvedev, N. [9 ]
Rethfeld, B. [7 ,8 ]
Ridgway, M. C. [1 ]
Kluth, P. [1 ]
机构
[1] Australian Natl Univ, Res Sch Phys & Engn, Canberra, ACT 0200, Australia
[2] Australian Synchrotron, Clayton, Vic 3168, Australia
[3] Oak Ridge Natl Lab, Mat Sci & Technol Div, Oak Ridge, TN 37831 USA
[4] Univ Helsinki, Helsinki Inst Phys, FIN-00014 Helsinki, Finland
[5] Univ Helsinki, Dept Phys, FIN-00014 Helsinki, Finland
[6] Univ Duisburg Essen, Fak Phys, D-47057 Duisburg, Germany
[7] Tech Univ Kaiserslautern, Dept Phys, D-67653 Kaiserslautern, Germany
[8] Tech Univ Kaiserslautern, OPTIMAS Res Ctr, D-67653 Kaiserslautern, Germany
[9] DESY, Ctr Free Electron Laser Sci, D-22607 Hamburg, Germany
来源
PHYSICAL REVIEW B | 2013年 / 88卷 / 17期
关键词
PHASE-TRANSITION; HEAVY-IONS; SEMICONDUCTORS; IRRADIATION; FULLERENES; DYNAMICS; DENSITY; SOLIDS; METALS; GLASS;
D O I
10.1103/PhysRevB.88.174111
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We present experimental evidence for the formation of ion tracks in amorphous Si induced by swift heavy-ion irradiation. An underlying core-shell structure consistent with remnants of a high-density liquid structure was revealed by small-angle x-ray scattering and molecular dynamics simulations. Ion track dimensions differ for as-implanted and relaxed Si as attributed to different microstructures and melting temperatures. The identification and characterization of ion tracks in amorphous Si yields new insight into mechanisms of damage formation due to swift heavy-ion irradiation in amorphous semiconductors.
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页数:5
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