Negative-U System of Carbon Vacancy in 4H-SiC

被引:231
作者
Son, N. T. [1 ]
Trinh, X. T. [1 ]
Lovlie, L. S. [2 ]
Svensson, B. G. [2 ]
Kawahara, K. [3 ]
Suda, J. [3 ]
Kimoto, T. [3 ]
Umeda, T. [4 ]
Isoya, J. [5 ]
Makino, T. [6 ]
Ohshima, T. [6 ]
Janzen, E. [1 ]
机构
[1] Linkoping Univ, Dept Phys Chem & Biol, SE-58183 Linkoping, Sweden
[2] Univ Oslo, Ctr Mat Sci & Nanotechnol, Dept Phys, N-0316 Oslo, Norway
[3] Kyoto Univ, Dept Elect Sci Engn, Nishikyo Ku, Kyoto 6158510, Japan
[4] Univ Tsukuba, Grad Sch Pure & Appl Sci, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan
[5] Univ Tsukuba, Grad Sch Lib Informat & Media Studies, Tsukuba, Ibaraki 3058550, Japan
[6] Japan Atom Energy Agcy, Takasaki, Gunma 3701292, Japan
基金
瑞典研究理事会;
关键词
DEEP-LEVEL DEFECTS; ELECTRONIC-STRUCTURE; EPITAXIAL LAYERS; SILICON-CARBIDE; SEMICONDUCTORS; CENTERS;
D O I
10.1103/PhysRevLett.109.187603
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Using electron paramagnetic resonance (EPR), energy levels of the carbon vacancy (V-C) in 4H-SiC and its negative-U properties have been determined. Combining EPR and deep-level transient spectroscopy we show that the two most common defects in as-grown 4H-SiC-the Z(1/2) lifetime-limiting defect and the EH7 deep defect-are related to the double acceptor (2 - vertical bar 0) and single donor (0 vertical bar +) levels of V-C, respectively.
引用
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页数:5
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