In situ doping of catalyst-free InAs nanowires with Si: Growth, polytypism, and local vibrational modes of Si

被引:15
作者
Dimakis, Emmanouil [1 ]
Ramsteiner, Manfred [1 ]
Huang, Chang-Ning [1 ]
Trampert, Achim [1 ]
Davydok, Anton [2 ]
Biermanns, Andreas [2 ]
Pietsch, Ullrich [2 ]
Riechert, Henning [1 ]
Geelhaar, Lutz [1 ]
机构
[1] Paul Drude Inst Festkorperelekt, D-10117 Berlin, Germany
[2] Univ Siegen, D-57072 Siegen, Germany
关键词
III-V NANOWIRES; WRAP-GATE TRANSISTORS; GAAS NANOWIRES; EPITAXIAL-GROWTH; ZINC-BLENDE; SUPERLATTICES; SPECTROSCOPY; RAMAN;
D O I
10.1063/1.4824344
中图分类号
O59 [应用物理学];
学科分类号
摘要
Growth and structural aspects of the in situ doping of InAs nanowires with Si have been investigated. The nanowires were grown catalyst-free on Si(111) substrates by molecular beam epitaxy. The supply of Si influenced the growth kinetics, affecting the nanowire dimensions, but not the degree of structural polytypism, which was always pronounced. As determined by Raman spectroscopy, Si was incorporated as substitutional impurity exclusively on In sites, which makes it a donor. Previously unknown Si-related Raman peaks at 355 and 360 cm(-1) were identified, based on their symmetry properties in polarization-dependent measurements, as the two local vibrational modes of an isolated Si impurity on In site along and perpendicular, respectively, to the c-axis of the wurtzite InAs crystal. (C) 2013 AIP Publishing LLC.
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页数:5
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